COCOS（半导体电晕氧化物表征）计量学：物理原理和应用

发布到: ASTM Conference on Gate Dielectric Oxide Integrity, 1999

年: 1999

作者: M. Wilson, J. Lagowski, A. Savtchouk, L. Jastrzebski, J. D'Amico

COCOScoronaInterface Trapstress induced leakage currentiron contaminationContact Potential Difference (CPD)

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