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Correlation Of Nitride Spacer Plasma Damage Results From Conventional Gate Capacitor Electrical Tests And A New, Non-contact Approach
发布到:
International Symposium on Plasma Process-Induced Damage, 1997.
年:
1997
作者:
M.W. Goss, A. Findlay
Capacitors
etching
Plasma applications
Plasma devices
Plasma diagnostics
Plasma materials processing
Plasma measurements
Plasma stability
Pulse measurements
Testing
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