Monitoring of Fe Contamination on Si Surfaces Using Non-Contact Surface Charge Profiler

发布到: Fourth International Symposium on Cleaning Technology in Semiconductor Device, 1995

年: 1995

作者: P. Roman, I. Kashkoush, R.E. Novak, E. Kamieniecki, J. Ruzyllo

Surface Charge Profiler (SCP)Fe concentrationSi surfacesNon-Contact Measurement

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