Semilab

SE-1000 Spectroscopic Ellipsometry

This compact tabletop Spectroscopic Ellipsometer delivers precise thin film and optical property measurements in a modular, lab-friendly design. Covering a wide spectral range, it supports film thickness, refractive index, extinction ratio coefficient , and multilayer analysis with flexible measurement modes including ellipsometry, polarimetry, and twelve element Mueller-matrix.

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A Novel Pretreatment for Thin-Film Measurements

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Vacuum Volume 192, October 2021, 1104152021

Ammonia-vapour-induced two-layer transformation of mesoporous silica coatings on various substrates

著者: Lenke Kócs, Borbála Tegze, Emőke Albert, Csaba Major, András Szalai, Bálint Fodor, Péter Basa, György Sáfrán, Zoltán Hórvölgyi
porous silica coatingsspectroscopic ellipsometryELLIPSOMETRIC POROSIMETRYmesoporous
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Science Advances, Sci. Adv. 11, 2025

Amphiphilic nanopores that condense undersaturatedwater vapor and exude water droplets

著者: Baekmin Q. Kim1†, Zachariah Vicars1†, Máté Füredi2,3, Lilia F. Escobedo1, R. Bharath Venkatesh1‡, Stefan Guldin2,4,5, Amish J. Patel1*, Daeyeon Lee1
spectroscopic ellipsometry
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Thin Solid Films2022

Analysis of malaria infection byproducts with Mueller matrix transmission ellipsometry

著者: P. Basa, B. Fodor, Zs. Nagy, B. Oyunbolor, A. Hajtman, S. Bordács, I. Kézsmárki, A. Halbritter, Á. Orbán
ellipsometryrotating compensatormueller matrixspectroscopic ellipsometer
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Advanced Semiconductor Manufacturing Conference ASMC), 2014 Annual SEMI2014

Benefit of Combining Metrology Techniques for Thin SiGe:B Layers

著者: D. Le Cunff, T. Nguyen, R. Duru, F. Abbate, J. Hoglund, N. Laurent, F. Pernot, M. Wormington
Ge-Si alloysboronelemental semiconductorssemiconductor doping
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The Journal of Physical Chemistry Letters2024

Beyond the Meso-/Macroporous boundary: Extending Capillary Condensation-based Pore Size Characterization in Thin Films Through Tailored Adsorptives

著者: Máté Füredi, Cristina V. Manzano, András Marton, Bálint Fodor, Alberto Alvarez-Fernandez,*
EP
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Nanoscale Horizons, 2025, Advance Article, UK (The Royal Society of Chemistry 2025) Nanoscale Horizons, 2025,10, 760-7692025

Block copolymer-assembled nanopore arrays enable ultrasensitive label-free DNA detection

著者: Maximiliano Jesus Jara Fornerod, Alberto Alvarez-Fernandez, Máté Füredi, Anandapadmanabhan A Rajendran, Beatriz Prieto-Simón, Nicolas H. Voelcker, Stefan Guldin
spectroscopic ellipsometry
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Applied Surface Science 269 (2013) 23– 282013

Charging Behavior of Silicon Nitride Based Non-Volatile Memory Structures with Embedded Semiconductor Nanocrystals

著者: Zs.J. Horváth, P. Basa, T. Jászi, K.Z. Molnár, A.E. Pap, Gy. Molnár
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UCPSS, Sep. 2002, Oostende, Belgium2002

Cleaning of Si Surfaces by Lamp Illumination

著者: A. Danel, C.L. Tsai, K. Shanmugasundaram, F. Tardif, E. Kamieniecki, J. Ruzyllo
Lamp cleaningOrganic contaminationVolatile contaminantshydrocarbons
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Journal of Micro/Nanopatterning, Materials, and Metrology, Vol. 23, Issue 1, 014001 (February 2024).2024

Detection of structural asymmetries in Forksheet FET arrays using Mueller matrix ellipsometry, a theoretical study

著者: Balogh Imre, Kiss Roberta Zsófia, Egri Dávid
spectroscopic ellipsometry
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Thin Solid Films 590 2015) 1342015

Ellipsometry Study of Process Deposition of Amorphous Indium Gallium Zinc Oxide Sputtered Thin Films

著者: C. Talagrand, X. Boddaert, D.G. Selmeczi, C. Defranoux, P. Collot
InGaZnOspectroscopic ellipsometryDielectric functionProcess deposition
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Physica Status Solidi (a) 7/20172017

Ferroelectric HfO2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology

著者: Dmitriy Marinskiy, Patrick Polakowski, Piotr Edelman, Marshall Wilson, Jacek Lagowski, Joachim Metzger, Robert Binder, Johannes Müller
corona - Kelvinnoncontact metrologysurface voltageTHIN FILM CHARACTERIZATION
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Applied Surface Science 379 2016) 3042016

Homogeneous Transparent Conductive ZnO:Ga by ALD for Large LED Wafers

著者: Homogeneous Transparent Conductive ZnO:Ga by ALD for Large LED Wafers
GZO; Atomic layer deposition; TCO; Rapid thermal annealing; LED
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Journal of Applied Physics2016

Inkjet-Printed Vertically Emitting Solid-State Organic Lasers

著者: O. Mhibik, S. Ch´enais, S. Forget, Ch. Defranoux, S. Sanaur
vertically-emitting solid-state organic lasers (VECSOLs); inkjet printing; new host polymer matrix for standard laser dyes; Tunable laser
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IEEE Photovoltaic Specialists Conference PVSC), 20122012

Integrated Electrical and Optical Characterization of Large Area Thin Film Photovoltaic Materials

著者: G. Szitási, F. Korsós, D. Selmeczi, O. Takács, F. Novinics, P. Tüttő, A. Findlay, M. Wilson
eddy current testingellipsometryfluorinephotoconducting materials
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Thin Solid Films2023

Internal wettability investigation of mesoporous silica materials by ellipsometric porosimetry

著者: Máté Füredi, Bálint Fodor, András Marton, Alberto Alvarez-Fernandez, Aysha ARiaz, Curran Kalha, Anna Regoutz, Stefan Guldin, Péter Basa
Ellipsometersellipsometryellipsometry porosimetryELLIPSOMETRIC POROSIMETRY
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Journal of Vacuum Science & Technology B2019

Monitoring subwavelength grating structures for vertical-cavity surface-emitting laser applications by spectroscopic ellipsometry

著者: Emeric Balogh, Peter Basa, Attila Suto, Benjamin Powell, Anna Bölcskei-Molnár, and Szilvia Biró
ellipsometryspectroscopic ellipsometry
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Applied Physics Letters 115, 1619022019

Near-infrared optical properties and proposed phase-change usefulness of transition metal disulfides

著者: Akshay Singh, Yifei Li, Balint Fodor, Laszlo Makai, Jian Zhou, Haowei Xu, Austin Akey, Ju Li and R. Jaramillo
ellipsometryvisible spectraTransmission electron microscopyDensity functional theory
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Thin Solid Films 567 2014) 142014

On Determining the Optical Properties and Layer Structure from Spectroscopic Ellipsometric Data using Automated Artifact Minimization Method

著者: J. Budai, B. Farkas, Z.L. Horváth, Zs. Geretovszky
ellipsometrymodellingArtifact minimizationNumerical inversion
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Advanced Sensor Research Volume2, Issue7 July 2023, 22000772023

On the Rational Design of Mesoporous Silica Humidity Sensors

著者: Máté Füredi, Alberto Alvarez-Fernandez, Maximiliano Jesus Jara Fornerod, Bálint Fodor, and Stefan Guldin
spectroscopic ellipsometryEP
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Optics Letters, Vol. 38, Issue 19, pp. 3969-39722013

Spectroscopic Ellipsometry on Metal and Metal-Oxide Multilayer Hybrid Plasmonic Nanostructures

著者: A.A. Khosroabadi, P. Gangopadhyay, B. Cocilovo, L. Makai, P. Basa, B. Duong, J. Thomas, and R.A. Norwood
spectroscopic ellipsometry
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Thin Solid Films2022

Spectroscopic ellipsometry investigation of free liquid-liquid and liquid-air interfaces

著者: László Makai, Benjamin Kalas, György Tiborcz
EllipsometersellipsometryInterfacesspectroscopic ellipsometry
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ACS Electrochemistry 2025, 1, 6, 962–9732025

Structural Evolution of Silicon Nitride Anodes during Electrochemical Lithiation

著者: Adam J. Lovett*, Máté Füredi, Liam Bird, Samia Said, Brandon Frost, Paul R. Shearing, Stefan Guldin, Thomas S. Miller*
spectroscopic ellipsometry
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Thin Solid Films 571 2014) 7202014

Study of Annealing Effects Upon the Optical and Electrical Properties of SnO2:F/SiCxOy Low Emissivity Coatings by Spectroscopic Ellipsometry

著者: K. Wang, B. Cheng, B. Wu, C. Defranoux, P. Basa, C. Song, G. Han, Y. Liu
spectroscopic ellipsometryFluorinated tin oxideLow emissivityannealing
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Journal of Materials Chemistry C, Royal Society of Chemistry2024

The influence of stabiliser concentration on the formation of In2O3 thin films

著者: Aysha A. Riaz, Curran Kalha Maria Basso, Máté Füredi, Anna Regoutz
spectroscopic ellipsometry
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関連ホワイトペーパー

Forksheet FET - the Future of Transistor Manufacturing?

August 18, 2025

Forksheet FET - the Future of Transistor Manufacturing?

Semilab, within the IT2 EU project, explores Mueller matrix ellipsometry as a powerful method to detect asymmetries in forksheet FETs—offering enhanced precision over conventional techniques and supporting Europe's push for semiconductor innovation.

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August 18, 2025

How Does Advanced Metrology Benefit the PV Industry?

Explore how advanced metrology plays a crucial role in the photovoltaic industry by enhancing efficiency, ensuring quality control, supporting research and development, and reducing costs.

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How Spectral Ellipsometry Measurements are Conducted on Bulk Liquids

August 18, 2025

How Spectral Ellipsometry Measurements are Conducted on Bulk Liquids

Enabling precise optical characterization of bulk liquids using advanced spectral ellipsometry despite interface instability.

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How to Determine the Internal Wettability of Nanostructured Thin Films

August 18, 2025

How to Determine the Internal Wettability of Nanostructured Thin Films

Advancing wettability analysis of nanostructured thin films with ellipsometric porosimetry and spectral ellipsometry.

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Precision Measurement Tools for the Sub-Nanoscale

August 18, 2025

Precision Measurement Tools for the Sub-Nanoscale

Real-time in situ spectroscopic ellipsometry reveals key insights into sub-nanoscale growth of molybdenum carbide thin films.

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R&D Keeps The World Moving Forward - So Are Semilab’s Spectroscopic Ellipsometry Solutions

October 17, 2025

R&D Keeps The World Moving Forward - So Are Semilab’s Spectroscopic Ellipsometry Solutions

Technological development is transforming every aspect of our lives and our world at an unprecedented rate, and Semilab proudly contributes to this incredible pace.

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R&D Lab Tools for the Display Industry

August 18, 2025

R&D Lab Tools for the Display Industry

Innovation in the electronic display industry is driven by advanced R&D tools enabling precise measurement and development.

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