高级浇口前清洁的评估

发布到: Cleaning Technology in Semiconductor Device Manufacturing, Proceedings of the Sixth International Symposium Oct.1999), Vol. 99-36, pages 59-68

年: 1999

作者: C. Cowache, P. Boelen, I. Kashkoush, P Besson, F. Tardif

pre-gate cleaningparticle removalmetal removalsurface microroughnesssurface passivation

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