NIST Traceable Small Signal Surface Photo Voltage Reference Wafer
掲載誌: International Conference on Frontiers of Characterization and Metrology, 2007
年: 2007
著者: A. Bertuch, K. Steeples
NIST traceablesurface photovoltagestandardreference waferElectric measurementsElectrical resistivityMetrologyEpitaxySilicon (Si)
出版物を読む
Small Signal Surface Photo Voltage (SPV) measurement has become a widely accepted metrology for measuring resistivity of epitaxial and Czochralski wafers. For this metrology technique there are currently no Standard Reference Matertials (SRMs®) as defined by the National Institute of Standards and Technology (NIST). This paper will present a method for creating a NIST traceable standard for SPV measurement by further processing NIST 100 mm diameter silicon resistivity, SRM 2543 wafers.
