Use of Non-Contact Resistivity Measurements for Epitaxy: Surface Charge Profiler Method
掲載誌: International Symposium on High Purity Silicon
年: 1998
著者: A. Danel, F. Tardif, G. Kamarinos, M.C. Nguyen
high purity siliconSurface Charge Profiler (SCP)Doping measurements
