inSE-1000 Spectroscopic Ellipsometry
This high-performance, non-contact, non-destructive optical metrology tool provides precise measurement of thin film thickness and optical constants across single and multilayer structures. Designed for R&D labs, universities, and industries like semiconductor, PV and optics, it supports advanced modeling, mapping, and real-time data visualization.
Related Publications
Ammonia-vapour-induced two-layer transformation of mesoporous silica coatings on various substrates
Amphiphilic nanopores that condense undersaturatedwater vapor and exude water droplets
Analysis of malaria infection byproducts with Mueller matrix transmission ellipsometry
Beyond the Meso-/Macroporous boundary: Extending Capillary Condensation-based Pore Size Characterization in Thin Films Through Tailored Adsorptives
Block copolymer-assembled nanopore arrays enable ultrasensitive label-free DNA detection
Detection of structural asymmetries in Forksheet FET arrays using Mueller matrix ellipsometry, a theoretical study
Internal wettability investigation of mesoporous silica materials by ellipsometric porosimetry
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Near-infrared optical properties and proposed phase-change usefulness of transition metal disulfides
On the Rational Design of Mesoporous Silica Humidity Sensors
Spectroscopic ellipsometry investigation of free liquid-liquid and liquid-air interfaces
Structural Evolution of Silicon Nitride Anodes during Electrochemical Lithiation
The influence of stabiliser concentration on the formation of In2O3 thin films
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