Kelvin Force Probe Microscopy of Ferroelectric Si: HfO2
Published to: Meeting Abstracts - The Electrochemical Society
Year: 2017
Author: Dmitriy Marinskiy, Patrick Polakowski, Jacek Lagowski, Marshall Wilson, Piotr Edelman, Johannes Müller
corona - KelvinNon-Contact MeasurementTHIN FILM CHARACTERIZATION
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