
このモジュール式分光エリプソメータは、単一装置として最も広い波長範囲(190 nm〜25 µm)をカバーする高い汎用性を持つ薄膜評価システムです。非接触・非破壊で膜厚、光学定数、多層膜スタック、先端材料特性の解析を、比類のない柔軟性で実現します。
SE-2000 分光エリプソメトリー
著者: Ferenc Korsós, Péter Tüttő, Ilias Saegh, Krisztián Kis-Szabó, and Attila Tóth
トピック: 4pp; diffusion; junction photovoltage technique; photovoltaics; process monitoring
著者: Lenke Kócs, Borbála Tegze, Emőke Albert, Csaba Major, András Szalai, Bálint Fodor, Péter Basa, György Sáfrán, Zoltán Hórvölgyi
トピック: porous silica coatings; spectroscopic ellipsometry; ELLIPSOMETRIC POROSIMETRY; mesoporous; anti-reflective coatings
著者: Baekmin Q. Kim1†, Zachariah Vicars1†, Máté Füredi2,3, Lilia F. Escobedo1, R. Bharath Venkatesh1‡, Stefan Guldin2,4,5, Amish J. Patel1*, Daeyeon Lee1
トピック: spectroscopic ellipsometry
著者: P. Basa, B. Fodor, Zs. Nagy, B. Oyunbolor, A. Hajtman, S. Bordács, I. Kézsmárki, A. Halbritter, Á. Orbán
トピック: ellipsometry; rotating compensator; mueller matrix; spectroscopic ellipsometer
著者: D. Le Cunff, T. Nguyen, R. Duru, F. Abbate, J. Hoglund, N. Laurent, F. Pernot, M. Wormington
トピック: Ge-Si alloys; boron; elemental semiconductors; semiconductor doping; semiconductor epitaxial layers
著者: Máté Füredi, Cristina V. Manzano, András Marton, Bálint Fodor, Alberto Alvarez-Fernandez,*
トピック: EP
著者: Maximiliano Jesus Jara Fornerod, Alberto Alvarez-Fernandez, Máté Füredi, Anandapadmanabhan A Rajendran, Beatriz Prieto-Simón, Nicolas H. Voelcker, Stefan Guldin
トピック: spectroscopic ellipsometry
著者: László Makai, Tero Lehto, Bálint Fodor, Peter King
トピック: doping; Electrical properties; spectroscopic ellipsometry; thin films; atomic layer deposition
著者: Zs.J. Horváth, P. Basa, T. Jászi, K.Z. Molnár, A.E. Pap, Gy. Molnár
著者: A. Danel, C.L. Tsai, K. Shanmugasundaram, F. Tardif, E. Kamieniecki, J. Ruzyllo
トピック: Lamp cleaning; Organic contamination; Volatile contaminants; hydrocarbons
著者: Balogh Imre, Kiss Roberta Zsófia, Egri Dávid
トピック: spectroscopic ellipsometry
著者: C. Talagrand, X. Boddaert, D.G. Selmeczi, C. Defranoux, P. Collot
トピック: InGaZnO; spectroscopic ellipsometry; Dielectric function; Process deposition; Amorphous semiconductor
著者: Homogeneous Transparent Conductive ZnO:Ga by ALD for Large LED Wafers
トピック: GZO; Atomic layer deposition; TCO; Rapid thermal annealing; LED
著者: O. Mhibik, S. Ch´enais, S. Forget, Ch. Defranoux, S. Sanaur
トピック: vertically-emitting solid-state organic lasers (VECSOLs); inkjet printing; new host polymer matrix for standard laser dyes; Tunable laser
著者: Máté Füredi, Bálint Fodor, András Marton, Alberto Alvarez-Fernandez, Aysha ARiaz, Curran Kalha, Anna Regoutz, Stefan Guldin, Péter Basa
トピック: Ellipsometers; ellipsometry; ellipsometry porosimetry; ELLIPSOMETRIC POROSIMETRY; ELLIPSOMETRIC POROSIMETRY (R&D); Mesoporous silica films; Porosimetry; mesoporous
著者: Emeric Balogh, Peter Basa, Attila Suto, Benjamin Powell, Anna Bölcskei-Molnár, and Szilvia Biró
トピック: ellipsometry; spectroscopic ellipsometry
著者: Akshay Singh, Yifei Li, Balint Fodor, Laszlo Makai, Jian Zhou, Haowei Xu, Austin Akey, Ju Li and R. Jaramillo
トピック: ellipsometry; visible spectra; Transmission electron microscopy; Density functional theory; Photonic integrated circuits; Transition metal chalcogenides; Optical metrology; Crystalline solids; Optical electronics
著者: J. Budai, B. Farkas, Z.L. Horváth, Zs. Geretovszky
トピック: ellipsometry; modelling; Artifact minimization; Numerical inversion
著者: Máté Füredi, Alberto Alvarez-Fernandez, Maximiliano Jesus Jara Fornerod, Bálint Fodor, and Stefan Guldin
トピック: spectroscopic ellipsometry; EP
著者: A.A. Khosroabadi, P. Gangopadhyay, B. Cocilovo, L. Makai, P. Basa, B. Duong, J. Thomas, and R.A. Norwood
トピック: spectroscopic ellipsometry
著者: László Makai, Benjamin Kalas, György Tiborcz
トピック: Ellipsometers; ellipsometry; Interfaces; spectroscopic ellipsometry; Surface; Surface measurement
著者: Adam J. Lovett*, Máté Füredi, Liam Bird, Samia Said, Brandon Frost, Paul R. Shearing, Stefan Guldin, Thomas S. Miller*
トピック: spectroscopic ellipsometry
著者: K. Wang, B. Cheng, B. Wu, C. Defranoux, P. Basa, C. Song, G. Han, Y. Liu
トピック: spectroscopic ellipsometry; Fluorinated tin oxide; Low emissivity; annealing
著者: Windisch M., Buza G., Maloveczky A., Vida Á., Selmeczi D., Dankházi Z.:
トピック: Si surfaces; spectroscopic ellipsometry; surface treatment
著者: Aysha A. Riaz, Curran Kalha Maria Basso, Máté Füredi, Anna Regoutz
トピック: spectroscopic ellipsometry